Producing high-purity wafers via the CMP process is a critical application and the halting of harmful slurry-DIW ...

Taiwan - As the semiconductor industry continues to advance, the demand for precision processing becomes increasingly critical. Dr. Song, a global leader in the development of semiconductor process ...

Chemical mechanical polishing (CMP) is a process of global planarization that leverages the synergetic effect of chemical reactions and mechanical abrasion to facilitate wafer polishing. CMP has ...

The electronic chemical start-up ChEmpower has raised $18.7 million in a series A funding round to advance its abrasive-free system for polishing and planarizing silicon wafers during semiconductor ...

This higher density of circuitry on a wafer requires greater accuracy and a highly fragile and advanced fabrication process. Several newer and highly complex ICs today are made of a dozen or more ...

INITIAL PRODUCTS TO BE SOLD INCLUDE CHEMICAL MECHANICAL PLANARIZATION (CMP) SOLUTIONS FOR SILICON CARBIDE (SiC) APPLICATIONS BILLERICA, Mass.--(BUSINESS WIRE)-- Entegris, Inc. (Nasdaq: ENTG), a ...

Chemical mechanical polishing (CMP) of gallium nitride (GaN) is a critical process in semiconductor manufacturing, enabling the attainment of atomically smooth, damage‐free surfaces essential for high ...