Tech Xplore on MSN

New semiconductor etching process achieves five-fold speed improvement

After more than a decade of research and development, Tokyo Electron Miyagi Ltd. has introduced an innovative semiconductor ...
DIGITIMES

Trymax ?? Plasma-based etching, stripping and curing process equipment maker

Trymax Semiconductor B.V. provides plasma-based etching, stripping, and curing process equipment for advanced semiconductor ...
Science Daily

Scientist uncovers physics behind plasma-etching process

A team of physicists has uncovered some of the physics that make possible the etching of silicon computer chips, which power cell phones, computers, and a huge range of electronic devices. Physicist ...
Yahoo

After 20 years of research, DirectDrive plasma etching tech to transform chip making

Imagine trying to carve a tiny, complex sculpture into a block the size of your fingernail again and again, billions of times, with nearly no room for error. That’s ...
AZOM

Advancements in Plasma Etching and Deposition Processes for Compound Semiconductor Materials Applications

In this interview, AZoM talks to Bas Derksema about advancements in plasma etching and deposition processes for compound semiconductor materials applications. Please could you introduce yourself and ...
Nature

Plasma Etching and Atomic Layer Etching Processes

Plasma etching and atomic layer etching (ALE) constitute essential techniques in the fabrication of next‐generation nanoscale devices. Plasma etching utilises ionised gases to selectively remove ...
Eureka

Tokyo Electron and Nagoya University Develop Ultra-Fast HF Plasma Etching

Discover Tokyo Electron’s new semiconductor etching method for faster, greener, and precise chip production. Read more ...
Electronics For You

Faster Etching Boosts Chip Manufacturing

A new cryogenic plasma etching technique developed by Japanese researchers dramatically accelerates semiconductor fabrication while cutting environmental impact, offering a potential breakthrough for ...
AZOM

High-Density Plasma to Achieve Fast Etching and Deposition Rates—PlasmaPro 100 Cobra

Let us help you with your inquiries, brochures and pricing requirements Request A Quote Download PDF Copy Download Brochure The PlasmaPro 100 Cobra ICP RIE system ...
Business Wire

Nordson MARCH’s Plasma Confinement Ring Increases Etch Rate and Improves Treatment Uniformity for Wafer Processing

CONCORD, Calif.--(BUSINESS WIRE)--Nordson MARCH, a Nordson company (NASDAQ:NDSN), a global leader in plasma cleaning technology, introduces its Plasma Confinement Ring for wafer processing and wafer ...
Nanowerk

Reactive Ion Etching (RIE): Precise Nanoscale Patterning for Advanced Devices

What is Reactive Ion Etching (RIE)? Reactive Ion Etching (RIE) is a dry etching technique widely used in the fabrication of micro- and nanodevices. It combines the chemical reactivity of reactive ...
Nanowerk

Scientist uncovers physics behind plasma-etching process

(Nanowerk News) Physicist Igor Kaganovich at the Department of Energy's (DOE) Princeton Plasma Physics Laboratory (PPPL) and collaborators have uncovered some of the physics that make possible the ...